Application of advanced contamination analysis for qualification of wafer handling systems and chucks

Kroninger F, Streckfuss N, Frey L, Falter T, Ryzlewicz C, Pfitzner L, Ryssel H (1993)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 1993

Journal

Applied Surface Science Elsevier

Book Volume: 63

Pages Range: 93-98

DOI: 10.1016/0169-4332(93)90070-R

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente Lothar Pfitzner Technische Fakultät Heiner Ryssel Technische Fakultät

How to cite

APA:

Kroninger, F., Streckfuss, N., Frey, L., Falter, T., Ryzlewicz, C., Pfitzner, L., & Ryssel, H. (1993). Application of advanced contamination analysis for qualification of wafer handling systems and chucks. Applied Surface Science, 63, 93-98. https://dx.doi.org/10.1016/0169-4332(93)90070-R

MLA:

Kroninger, F., et al. "Application of advanced contamination analysis for qualification of wafer handling systems and chucks." Applied Surface Science 63 (1993): 93-98.

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