Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation

Strauß J, Baum M, Alexeev I, Schmidt M (2017)


Publication Language: English

Publication Type: Journal article, Original article

Publication year: 2017

Journal

Book Volume: 12

Pages Range: 86-90

Journal Issue: 2

URI: http://www.jlps.gr.jp/jlmn/upload/267828b35a4a05b6fd4d0589b6b25a1c.pdf

DOI: 10.2961/jlmn.2017.02.0007

Open Access Link: http://www.jlps.gr.jp/jlmn/upload/267828b35a4a05b6fd4d0589b6b25a1c.pdf

Abstract

In this publication we present a novel setup for the Optical Trap Assisted Nanopatterning (OTAN) technology. The setup allows process parallelization and thus higher throughput in this inventive and flexible direct-nanopatterning technology. We have determined the stiffness of the optical traps and compared the obtained result with the single beam OTAN parameters. Furthermore we estimate the increase in throughput for the parallelized approach in comparison to the conventional system

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APA:

Strauß, J., Baum, M., Alexeev, I., & Schmidt, M. (2017). Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation. Journal of Laser Micro Nanoengineering, 12(2), 86-90. https://doi.org/10.2961/jlmn.2017.02.0007

MLA:

Strauß, Johannes, et al. "Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation." Journal of Laser Micro Nanoengineering 12.2 (2017): 86-90.

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