Naujoks D, Richert J, Decker P, Weiser M, Virtanen S, Ludwig A (2016)
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 2016
Publisher: American Chemical Society
Book Volume: 18
Pages Range: 575-582
Journal Issue: 9
DOI: 10.1021/acscombsci.6b00052
The complete ternary system Ni-Co-Al was fabricated as a thin film materials library by combinatorial magnetron sputtering and was annealed subsequently in several steps in Ar and under atmospheric conditions at 500 °C. Ni-Co-Al is the base system for both Ni- and Co-based superalloys. Therefore, the phases occurring in this system and their oxidation behavior is of high interest. The Ni-Co-Al materials library was investigated using high-throughput characterization methods such as optical measurements, resistance screening, automated EDX, automated XRD, and XPS. From the obtained data a thin film phase diagram for the Ni-Co-Al system in its state after annealing at 500 °C in air was established. Furthermore, a surface oxide composition map of the full Ni-Co-Al system for oxidation at 500 °C was concluded. As a result, it could be shown that at 500 °C an amount of 10 at. % Al is necessary for a Ni-Co-Al thin film to produce a protective Al-oxide scale.
APA:
Naujoks, D., Richert, J., Decker, P., Weiser, M., Virtanen, S., & Ludwig, A. (2016). Phase Formation and Oxidation Behavior at 500 °c in a Ni-Co-Al Thin-Film Materials Library. ACS Combinatorial Science, 18(9), 575-582. https://doi.org/10.1021/acscombsci.6b00052
MLA:
Naujoks, Dennis, et al. "Phase Formation and Oxidation Behavior at 500 °c in a Ni-Co-Al Thin-Film Materials Library." ACS Combinatorial Science 18.9 (2016): 575-582.
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