Analysis of the supercritical antisolvent mechanisms governing particles precipitation and morphology by in situ laser scattering techniques
Bräuer A, Dowy S, Torino E, Roßmann M, Luther S, Schlücker E, Leipertz A, Reverchon E (2011)
Publication Type: Journal article, Original article
Publication year: 2011
Journal
Publisher: Elsevier
Book Volume: 173
Pages Range: 258-266
Authors with CRIS profile
Andreas Bräuer
Erlangen Graduate School in Advanced Optical Technologies
Matthias Roßmann
Lehrstuhl für Prozessmaschinen und Anlagentechnik
Sebastian Luther
Lehrstuhl für Technische Thermodynamik
Eberhard Schlücker
Lehrstuhl für Prozessmaschinen und Anlagentechnik
Alfred Leipertz
Lehrstuhl für Technische Thermodynamik
Involved external institutions
Italy (IT)How to cite
APA:
Bräuer, A., Dowy, S., Torino, E., Roßmann, M., Luther, S., Schlücker, E.,... Reverchon, E. (2011). Analysis of the supercritical antisolvent mechanisms governing particles precipitation and morphology by in situ laser scattering techniques. Chemical Engineering Journal, 173, 258-266.
MLA:
Bräuer, Andreas, et al. "Analysis of the supercritical antisolvent mechanisms governing particles precipitation and morphology by in situ laser scattering techniques." Chemical Engineering Journal 173 (2011): 258-266.
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