Nanopositioning and Nanomeasuring Machine NPMM-200 – sub-nanometre resolution and highest accuracy in extended macroscopic working areas

Beitrag bei einer Tagung
(Konferenzbeitrag)


Details zur Publikation

Autorinnen und Autoren: Manske E, Jäger G, Hausotte T, Müller A, Balzer F
Jahr der Veröffentlichung: 2017
Sprache: Englisch


Abstract


At the Technische Universität Ilmenau, a new Nanopositioning and Nanomeasuring Machine NPMM 200 with a measuring range of 200 mm × 200 mm × 25 mm and a resolution of 0.02 nm has been developed. In order to achieve both highest nanometre accuracy and largest three-dimensional working space, an extended three-dimensional Abbe comparator principle is applied. The object to be measured is placed on a special mirror plate whose position in all six degrees of freedom is measured by high-precision multi-axis fibre-coupled laser interferometers. By means of an advanced closed-loop control tilt errors induced by the guiding systems can be minimized up to interferometric level. This paper presents the metrological concept, the realized design, the conditioning of environmental parameters as well as some first measuring results.



FAU-Autorinnen und Autoren / FAU-Herausgeberinnen und Herausgeber

Hausotte, Tino Prof. Dr.-Ing.
Lehrstuhl für Fertigungsmesstechnik


Einrichtungen weiterer Autorinnen und Autoren

Technische Universität Ilmenau


Zitierweisen

APA:
Manske, E., Jäger, G., Hausotte, T., Müller, A., & Balzer, F. (2017). Nanopositioning and Nanomeasuring Machine NPMM-200 – sub-nanometre resolution and highest accuracy in extended macroscopic working areas. In Proceedings of the euspen’s 17th International Conference & Exhibition. Hannover, DE.

MLA:
Manske, Eberhard, et al. "Nanopositioning and Nanomeasuring Machine NPMM-200 – sub-nanometre resolution and highest accuracy in extended macroscopic working areas." Proceedings of the euspen’s 17th International Conference & Exhibition, Hannover 2017.

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