Functional epoxy polymer for direct nano-imprinting of micro-optical elements

Fader R, Landwehr J, Rumler M, Rommel M, Bauer A, Frey L, Voelkel R, Brehm M, Kraft A (2013)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2013

Journal

Microelectronic Engineering Elsevier

Book Volume: 110

Pages Range: 90-93

DOI: 10.1016/j.mee.2013.02.030

Abstract

This work presents a functional resist for the direct fabrication of micro-optical elements with UVenhanced substrate conformal imprint lithography (UV-SCIL). This functional resist is based on a UV-curable epoxy polymer where TiO nanoparticles are enclosed. Adding these particles to the polymer raises the refractive index of the functional resist with raising particle content from 1.52 up to 1.64 at a wavelength of 633 nm. Therefore, the refractive index can be matched for many micro-optical applications. Here, multilevel Fresnel lenses from a 200 mm silica substrate are transferred into the functional resist by UV-SCIL with nanometer resolution and high structure fidelity. © 2013 Elsevier B.V. All rights reserved.

Authors with CRIS profile

Maximilian Rumler Lehrstuhl für Elektronische Bauelemente Lothar Frey Lehrstuhl für Elektronische Bauelemente

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE)

How to cite

APA:

Fader, R., Landwehr, J., Rumler, M., Rommel, M., Bauer, A., Frey, L.,... Kraft, A. (2013). Functional epoxy polymer for direct nano-imprinting of micro-optical elements. Microelectronic Engineering, 110, 90-93. https://dx.doi.org/10.1016/j.mee.2013.02.030

MLA:

Fader, Robert, et al. "Functional epoxy polymer for direct nano-imprinting of micro-optical elements." Microelectronic Engineering 110 (2013): 90-93.

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