Jahn J, Erdmann A, Fühner T, Liu S, Shao F, Barenbaum A (2010)
Publication Type: Conference contribution, Original article
Publication year: 2010
Publisher: SPIE
Edited Volumes: Proceedings of SPIE - The International Society for Optical Engineering
Book Volume: 7640
Pages Range: 76403C
Conference Proceedings Title: Proceedings of the SPIE
Event location: San Jose
DOI: 10.1117/12.846441
This paper aims at identifying appropriate bottom anti-reflective coatings (BARCs) for double patterning techniques such as Litho-Freeze-Litho-Etch (LFLE). A short introduction into the employed optimization methodology, including variables, figures of merit, models and optimization algorithms is given. A study on the impact of a refractive index modulation caused by the first lithographic step is presented. Several optimization surveys taking the index modulation into account are set forth, and the results are discussed. In addition to optimization procedures aiming at optimizing one litho step at a time, a co-optimization study for both litho steps is proposed. Finally, two multi-objective optimization procedures that allow for a post-optimization exploration and selection of optimum solutions are presented. Numerous solutions are discussed in terms of their anti-reflectance behavior and their manufacturing feasibility. © 2010 SPIE.
APA:
Jahn, J., Erdmann, A., Fühner, T., Liu, S., Shao, F., & Barenbaum, A. (2010). Topography-aware BARC optimization for double patterning. In Proceedings of the SPIE (pp. 76403C). San Jose: SPIE.
MLA:
Jahn, Johannes, et al. "Topography-aware BARC optimization for double patterning." Proceedings of the SPIE Advanced Lithography, San Jose SPIE, 2010. 76403C.
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