Methylated [(benzene)(1,3-butadiene)Ru0] derivatives as novel MOCVD precursors with favorable properties

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Details zur Publikation

Autor(en): Jipa I, Siddiqi MA, Siddiqui RA, Atakan B, Marbach H, Cremer T, Maier F, Steinrück HP, Danova K, Popovska N, Heinemann F, Zenneck U
Zeitschrift: Chemical Vapor Deposition
Verlag: Wiley-VCH Verlag
Jahr der Veröffentlichung: 2011
Band: 17
Seitenbereich: 15-21
ISSN: 0948-1907


Abstract


[(Benzene)(2-methyl-1,3-butadiene)Ru] (1), [(benzene)(2,3- dimethyl-1,3-butadiene)Ru] (2), and [(2,3-dimethyl-1,3-butadiene) (toluene)Ru] (3) are prepared and tested as new metal-organic (MO) ruthenium precursor complexes with favorable deposition properties for the CVD of thin ruthenium films. X-ray diffraction (XRD) studies of single crystals of the complexes are characteristic for true Ru π-complexes without molecular structure peculiarities or significant intermolecular interactions in the solid state, which can hinder undecomposed evaporation. Differential thermal analysis (DTA) and vapor pressure data qualify the compounds as almost ideal MOCVD precursors. Thin ruthenium films are deposited successfully on silicon wafers at substrate temperatures between 200 and 400°C in a nitrogen gas atmosphere. X-ray photoelectron spectroscopy (XPS), four-point probe conductivity measurements, and atomic force microscopy (AFM) are used to characterize the films. All films consist of polycrystalline metallic ruthenium with a low surface roughness. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.



FAU-Autoren / FAU-Herausgeber

Cremer, Till Dr.
Lehrstuhl für Physikalische Chemie II
Heinemann, Frank Dr.
Lehrstuhl für Anorganische und Allgemeine Chemie
Maier, Florian Dr.
Lehrstuhl für Physikalische Chemie II
Marbach, Hubertus PD Dr.
Lehrstuhl für Physikalische Chemie II
Popovska, Nadejda Prof. Dr.
Technische Fakultät
Steinrück, Hans-Peter Prof. Dr.
Lehrstuhl für Physikalische Chemie II
Zenneck, Ulrich Prof. Dr.
Professur für Anorganische Chemie


Autor(en) der externen Einrichtung(en)
Universität Duisburg-Essen (UDE)


Zitierweisen

APA:
Jipa, I., Siddiqi, M.A., Siddiqui, R.A., Atakan, B., Marbach, H., Cremer, T.,... Zenneck, U. (2011). Methylated [(benzene)(1,3-butadiene)Ru0] derivatives as novel MOCVD precursors with favorable properties. Chemical Vapor Deposition, 17, 15-21. https://dx.doi.org/10.1002/cvde.201006853

MLA:
Jipa, Ilona, et al. "Methylated [(benzene)(1,3-butadiene)Ru0] derivatives as novel MOCVD precursors with favorable properties." Chemical Vapor Deposition 17 (2011): 15-21.

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Zuletzt aktualisiert 2018-08-08 um 21:55