Robust graphene membranes in a silicon carbide frame

Waldmann D, Butz B, Bauer S, Englert J, Jobst J, Ullmann K, Fromm F, Ammon MM, Enzelberger-Heim M, Hirsch A, Maier S, Schmuki P, Seyller T, Spiecker E, Weber HB, Spiecker E (2013)


Publication Type: Journal article

Publication year: 2013

Journal

Original Authors: Waldmann D, Butz B, Bauer S, Englert JM, Jobst J, Ullmann K, Fromm F, Ammon M, Enzelberger M, Hirsch A, Maier S, Schmuki P, Seyller T, Spiecker E, Weber HB

Publisher: American Chemical Society

Book Volume: 7

Pages Range: 4441-4448

Journal Issue: 5

DOI: 10.1021/nn401037c

Abstract

We present a fabrication process for freely suspended membranes consisting of bi- and trilayer graphene grown on silicon carbide. The procedure, involving photoelectrochemical etching, enables the simultaneous fabrication of hundreds of arbitrarily shaped membranes with an area up to 500 μm(2) and a yield of around 90%. Micro-Raman and atomic force microscopy measurements confirm that the graphene layer withstands the electrochemical etching and show that the membranes are virtually unstrained. The process delivers membranes with a cleanliness suited for high-resolution transmission electron microscopy (HRTEM) at atomic scale. The membrane, and its frame, is very robust with respect to thermal cycling above 1000 °C as well as harsh acidic or alkaline treatment.

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APA:

Waldmann, D., Butz, B., Bauer, S., Englert, J., Jobst, J., Ullmann, K.,... Spiecker, E. (2013). Robust graphene membranes in a silicon carbide frame. ACS nano, 7(5), 4441-4448. https://dx.doi.org/10.1021/nn401037c

MLA:

Waldmann, Daniel, et al. "Robust graphene membranes in a silicon carbide frame." ACS nano 7.5 (2013): 4441-4448.

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