Finite integration (FI) method for modeling optical wavers in lithography masks

Erdmann A, Pflaum C, Rahimi Z (2009)

Publication Type: Conference contribution, Conference Contribution

Publication year: 2009

Pages Range: ?

Conference Proceedings Title: 7th International Fraunhofer IISB Lithography Simulation Workshop

Event location: Hersbruck

Authors with CRIS profile

Christoph Pflaum Professur für Informatik (Numerische Simulation mit Höchstleistungsrechnern) Zhabiz Rahimi Graduiertenzentrum der FAU

Additional Organisation(s)

Erlangen Graduate School in Advanced Optical Technologies (SAOT)

How to cite

APA:

Erdmann, A., Pflaum, C., & Rahimi, Z. (2009). Finite integration (FI) method for modeling optical wavers in lithography masks. In 7th International Fraunhofer IISB Lithography Simulation Workshop (pp. ?). Hersbruck.

MLA:

Erdmann, Andreas, Christoph Pflaum, and Zhabiz Rahimi. "Finite integration (FI) method for modeling optical wavers in lithography masks." Proceedings of the 7th International Fraunhofer IISB Lithography Simulation Workshop, Hersbruck 2009. ?.

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