The influence of laser induced consolidation on the ablation threshold of nanoparticulate ITO-layers

Mikschl F, Baum M, Heberle J, Alexeev I, Schmidt M (2014)


Publication Language: English

Publication Type: Journal article, Online publication

Publication year: 2014

Journal

Publisher: Elsevier BV

Book Volume: 56

Pages Range: 991 – 997

DOI: 10.1016/j.phpro.2014.08.010

Open Access Link: http://ac.els-cdn.com/S1875389214001552/1-s2.0-S1875389214001552-main.pdf?_tid=a575ed9c-a244-11e5-ab35-00000aab0f6c&acdnat=1450085322_121f0c4c391b6be62611824e4de79424

Abstract

Indium tin oxide (ITO) is one of the few materials, which combines optical transparency in the wavelength range of visible light and electrical conductivity. It offers a wide range of applications in the field of optoelectronic devices such as solar cells or displays. To the present day, ITO is commonly deposited in a vacuum environment. Deposition under vacuum atmosphere is a
cost-intensive process and not compatible with modern manufacturing techniques, like roll-to-roll processing. To overcome this limitation we propose the generation of ITO layers by deposition of ITO nanoparticles under atmospheric conditions. For the generation of functional devices structured layers are required. The exact damage threshold of nanoparticulate ITO layers is essential to minimize influence of the structuring process on the substrate. In our measurements we used three different substrates, spin coated layers, annealed layers and consolidated layers.

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APA:

Mikschl, F., Baum, M., Heberle, J., Alexeev, I., & Schmidt, M. (2014). The influence of laser induced consolidation on the ablation threshold of nanoparticulate ITO-layers. Physics Procedia, 56, 991 – 997. https://dx.doi.org/10.1016/j.phpro.2014.08.010

MLA:

Mikschl, Florian, et al. "The influence of laser induced consolidation on the ablation threshold of nanoparticulate ITO-layers." Physics Procedia 56 (2014): 991 – 997.

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