Finite integration (FI) method for modelling optical waves in lithography masks

Conference contribution
(Conference Contribution)


Publication Details

Author(s): Rahimi Z, Erdmann A, Pflaum C
Publication year: 2009
Conference Proceedings Title: Proceedings of International Conference of "Electromagnetics in Advanced Applications", 2009. ICEAA '09
Pages range: 809-812


FAU Authors / FAU Editors

Erdmann, Andreas PD Dr.
Technische Fakultät
Pflaum, Christoph Prof. Dr.
Professur für Informatik (Numerische Simulation mit Höchstleistungsrechnern)
Rahimi, Zhabiz
Graduiertenzentrum der FAU


Additional Organisation
Erlangen Graduate School in Advanced Optical Technologies


How to cite

APA:
Rahimi, Z., Erdmann, A., & Pflaum, C. (2009). Finite integration (FI) method for modelling optical waves in lithography masks. In Proceedings of International Conference of "Electromagnetics in Advanced Applications", 2009. ICEAA '09 (pp. 809-812). Turin.

MLA:
Rahimi, Zhabiz, Andreas Erdmann, and Christoph Pflaum. "Finite integration (FI) method for modelling optical waves in lithography masks." Proceedings of the ICEAA '09, Turin 2009. 809-812.

BibTeX: 

Last updated on 2018-09-08 at 22:25