Finite integration (FI) method for modelling optical waves in lithography masks

Rahimi Z, Erdmann A, Pflaum C (2009)


Publication Type: Conference contribution, Conference Contribution

Publication year: 2009

Pages Range: 809-812

Conference Proceedings Title: Proceedings of International Conference of "Electromagnetics in Advanced Applications", 2009. ICEAA '09

Event location: Turin

URI: http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=5297317&isnumber=5297261

DOI: 10.1109/ICEAA.2009.5297317

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APA:

Rahimi, Z., Erdmann, A., & Pflaum, C. (2009). Finite integration (FI) method for modelling optical waves in lithography masks. In Proceedings of International Conference of "Electromagnetics in Advanced Applications", 2009. ICEAA '09 (pp. 809-812). Turin.

MLA:

Rahimi, Zhabiz, Andreas Erdmann, and Christoph Pflaum. "Finite integration (FI) method for modelling optical waves in lithography masks." Proceedings of the ICEAA '09, Turin 2009. 809-812.

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