Characterization of the scattering effect of complex mask geometries with surface roughness

Pflaum C, Rahimi Z, Erdmann A (2010)

Publication Type: Conference contribution, Conference Contribution

Publication year: 2010

Journal

Proceedings of SPIE Society of Photo-optical Instrumentation Engineers (SPIE)

Edited Volumes: Proceedings of SPIE - The International Society for Optical Engineering

Book Volume: 7717

Pages Range: 771709-771709-12

Conference Proceedings Title: Optical Modelling and Design

Event location: Brüssel

ISBN: 9780819481900

URI: http://spie.org/x648.html?product_id=853726

DOI: 10.1117/12.853726

Abstract

We present a finite integration technique (FIT) simulator for modelling light diffraction from lithographic masks with complex shapes. This method has high flexibility in geometrical modelling and treating curved boundaries. The inherent feature of FIT allows more accurate electromagnetic field simulation in complex structures. This technique is also suited for fast EMF simulations and large 3D problems because of its parallelisation potential. We applied this method to investigate the effect of complex mask shapes on the printed image. We demonstrate results for a phase-shift mask (PSM) with footing extensions and surface roughness. © 2010 SPIE.

Authors with CRIS profile

Christoph Pflaum Professur für Informatik (Numerische Simulation mit Höchstleistungsrechnern) Zhabiz Rahimi Graduiertenzentrum der FAU Andreas Erdmann Technische Fakultät

How to cite

APA:

Pflaum, C., Rahimi, Z., & Erdmann, A. (2010). Characterization of the scattering effect of complex mask geometries with surface roughness. In Optical Modelling and Design (pp. 771709-771709-12). Brüssel.

MLA:

Pflaum, Christoph, Zhabiz Rahimi, and Andreas Erdmann. "Characterization of the scattering effect of complex mask geometries with surface roughness." Proceedings of the SPIE Photonics Europe, Brüssel 2010. 771709-771709-12.

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