Characterization of the scattering effect of complex mask geometries with surface roughness

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Details zur Publikation

Autorinnen und Autoren: Pflaum C, Rahimi Z, Erdmann A
Titel Sammelwerk: Proceedings of SPIE - The International Society for Optical Engineering
Jahr der Veröffentlichung: 2010
Band: 7717
Tagungsband: Optical Modelling and Design
Seitenbereich: 771709-771709-12
ISBN: 9780819481900
ISSN: 0277-786X


Abstract


We present a finite integration technique (FIT) simulator for modelling light diffraction from lithographic masks with complex shapes. This method has high flexibility in geometrical modelling and treating curved boundaries. The inherent feature of FIT allows more accurate electromagnetic field simulation in complex structures. This technique is also suited for fast EMF simulations and large 3D problems because of its parallelisation potential. We applied this method to investigate the effect of complex mask shapes on the printed image. We demonstrate results for a phase-shift mask (PSM) with footing extensions and surface roughness. © 2010 SPIE.



FAU-Autorinnen und Autoren / FAU-Herausgeberinnen und Herausgeber

Erdmann, Andreas PD Dr.
Technische Fakultät
Pflaum, Christoph Prof. Dr.
Professur für Informatik (Numerische Simulation mit Höchstleistungsrechnern)
Rahimi, Zhabiz
Graduiertenzentrum der FAU


Zitierweisen

APA:
Pflaum, C., Rahimi, Z., & Erdmann, A. (2010). Characterization of the scattering effect of complex mask geometries with surface roughness. In Optical Modelling and Design (pp. 771709-771709-12). Brüssel.

MLA:
Pflaum, Christoph, Zhabiz Rahimi, and Andreas Erdmann. "Characterization of the scattering effect of complex mask geometries with surface roughness." Proceedings of the SPIE Photonics Europe, Brüssel 2010. 771709-771709-12.

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