Mask diffraction analysis and optimization for EUV masks

Erdmann A, Fühner T, Evanschitzky P (2010)

Publication Type: Conference contribution, Conference Contribution

Publication year: 2010

Book Volume: 9

Pages Range: 72711E

DOI: 10.1117/12.814119

Authors with CRIS profile

Tim Fühner Lehrstuhl für Informatik 3 (Rechnerarchitektur)

How to cite

APA:

Erdmann, A., Fühner, T., & Evanschitzky, P. (2010). Mask diffraction analysis and optimization for EUV masks. (pp. 72711E).

MLA:

Erdmann, Andreas, Tim Fühner, and Peter Evanschitzky. "Mask diffraction analysis and optimization for EUV masks." 2010. 72711E.

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