Patsis GP, Drygiannakis D, Raptis T, Gogoliddes E, Erdmann A (2009)
Publication Type: Journal article
Publication year: 2009
Book Volume: 86
Pages Range: 513
DOI: 10.1016/j.mee.2009.01.050
APA:
Patsis, G.P., Drygiannakis, D., Raptis, T., Gogoliddes, E., & Erdmann, A. (2009). Advanced lithography models for strict process control in the 32nm technology node. Microelectronic Engineering, 86, 513. https://dx.doi.org/10.1016/j.mee.2009.01.050
MLA:
Patsis, G. P., et al. "Advanced lithography models for strict process control in the 32nm technology node." Microelectronic Engineering 86 (2009): 513.
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