Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems

Fühner T, Erdmann A, Farkas R, Tollkühn B, Kókai G (2004)


Publication Language: English

Publication Type: Conference contribution, Original article

Publication year: 2004

Journal

Publisher: Springer-verlag

Edited Volumes: Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)

City/Town: Berlin Heidelberg

Book Volume: 3005

Pages Range: 208-219

Conference Proceedings Title: Applications of Evolutionary Computing - EvoWorkshops 2004: EvoBIO, EvoCOMNET, EvoHOT, EvoISAP, EvoMUSART, and EvoSTOC

Event location: Coimbra PT

ISBN: 3-540-21378-3

DOI: 10.1007/978-3-540-24653-4_22

Abstract

This paper proposes the use of a genetic algorithm to optimize mask and illumination geometries in optical projection lithography. A fitness function is introduced that evaluates the imaging quality of arbitrary line patterns in a specified focus range. As a second criterion the manufacturability and inspectability of the mask are taken into account. With this approach optimum imaging conditions can be identified without any additional a-priori knowledge of the lithographic process. Several examples demonstrate the successful application and further potentials of the proposed concept. © Springer-Verlag 2004.

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How to cite

APA:

Fühner, T., Erdmann, A., Farkas, R., Tollkühn, B., & Kókai, G. (2004). Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems. In Günther R. Raidl, Stefano Cagnoni, Jürgen Branke, David Wolfe Corne, Rolf Drechsler, Yaochu Jin, Colin G. Johnson, Penousal Machado, Elena Marchiori, Franz Rothlauf, George D. Smith, Giovanni Squillero (Eds.), Applications of Evolutionary Computing - EvoWorkshops 2004: EvoBIO, EvoCOMNET, EvoHOT, EvoISAP, EvoMUSART, and EvoSTOC (pp. 208-219). Coimbra, PT: Berlin Heidelberg: Springer-verlag.

MLA:

Fühner, Tim, et al. "Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems." Proceedings of the 1st European Workshop on Hardware Optimisation (EVOHOT2004), Coimbra Ed. Günther R. Raidl, Stefano Cagnoni, Jürgen Branke, David Wolfe Corne, Rolf Drechsler, Yaochu Jin, Colin G. Johnson, Penousal Machado, Elena Marchiori, Franz Rothlauf, George D. Smith, Giovanni Squillero, Berlin Heidelberg: Springer-verlag, 2004. 208-219.

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