Biber S, Schneiderbanger D, Schmidt LP (2004)
Publication Language: English
Publication Type: Conference contribution
Publication year: 2004
Edited Volumes: Conference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics
Pages Range: 105-106
Conference Proceedings Title: {29th } International Conference on Infrared and Millimeter Waves {, September}
Event location: Karlsruhe
DOI: 10.1109/ICIMW.2004.1421975
A high-resistivity silicon wafer was used to design a broad-band low loss window material for 600GHz by micromachining an artificial dielectric as a quarter wave transformer on the front and rear side of the wafer. The artificial dielectric is made from a 2-dimensional periodic structure to ensure the same transmission characteristics for horizontally and vertically polarized waves. © 2004 IEEE.
APA:
Biber, S., Schneiderbanger, D., & Schmidt, L.-P. (2004). Low Loss Silicon Window Material for Submillimeter Waves Using Micromachined Artificial Dielectrics for Anti-Reflection Coating. In {29th } International Conference on Infrared and Millimeter Waves {, September} (pp. 105-106). Karlsruhe.
MLA:
Biber, Stephan, Dirk Schneiderbanger, and Lorenz-Peter Schmidt. "Low Loss Silicon Window Material for Submillimeter Waves Using Micromachined Artificial Dielectrics for Anti-Reflection Coating." Proceedings of the Conference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics, Karlsruhe 2004. 105-106.
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