Simulation of plasma-immersed implantation of trenches

Conference contribution


Publication Details

Author(s): Rüde U
Title edited volumes: Proceedings of the International Conference on Ion Implantation Technology
Publisher: IEEE
Publication year: 1999
Conference Proceedings Title: IEEE Proceed. of the Intern. Conf. on Ion Implantation Technology
Pages range: 1187-1190


Abstract

The results of a particle-in-cell simulation for the plasma system in the Plasma Immersion Ion Implantation context is presented. PIII of two-dimensional trenches is studied using this simulation. Modeling of the potential around the trenches and the development of the plasma sheath in dependence on the pulse time is demonstrated. The implanted concentration, the average impact ion angle and the ion energy are computed as function of the pulse time and discussed in dependence on the aspect ratios of trenches.


FAU Authors / FAU Editors

Rüde, Ulrich Prof. Dr.
Lehrstuhl für Informatik 10 (Systemsimulation)

Last updated on 2018-20-08 at 11:23