Simulation of plasma-immersed implantation of trenches

Beitrag bei einer Tagung


Details zur Publikation

Autor(en): Rüde U
Titel Sammelwerk: Proceedings of the International Conference on Ion Implantation Technology
Verlag: IEEE
Jahr der Veröffentlichung: 1999
Tagungsband: IEEE Proceed. of the Intern. Conf. on Ion Implantation Technology
Seitenbereich: 1187-1190


Abstract

The results of a particle-in-cell simulation for the plasma system in the Plasma Immersion Ion Implantation context is presented. PIII of two-dimensional trenches is studied using this simulation. Modeling of the potential around the trenches and the development of the plasma sheath in dependence on the pulse time is demonstrated. The implanted concentration, the average impact ion angle and the ion energy are computed as function of the pulse time and discussed in dependence on the aspect ratios of trenches.


FAU-Autoren / FAU-Herausgeber

Rüde, Ulrich Prof. Dr.
Lehrstuhl für Informatik 10 (Systemsimulation)

Zuletzt aktualisiert 2018-20-08 um 11:23