Rüde U (1999)
Publication Type: Conference contribution
Publication year: 1999
Publisher: IEEE
Edited Volumes: Proceedings of the International Conference on Ion Implantation Technology
Pages Range: 1187-1190
Conference Proceedings Title: IEEE Proceed. of the Intern. Conf. on Ion Implantation Technology
Event location: Kyoto
URI: http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=813896
The results of a particle-in-cell simulation for the plasma system in the Plasma Immersion Ion Implantation context is presented. PIII of two-dimensional trenches is studied using this simulation. Modeling of the potential around the trenches and the development of the plasma sheath in dependence on the pulse time is demonstrated. The implanted concentration, the average impact ion angle and the ion energy are computed as function of the pulse time and discussed in dependence on the aspect ratios of trenches.
APA:
Rüde, U. (1999). Simulation of plasma-immersed implantation of trenches. In IEEE Proceed. of the Intern. Conf. on Ion Implantation Technology (pp. 1187-1190). Kyoto: IEEE.
MLA:
Rüde, Ulrich. "Simulation of plasma-immersed implantation of trenches." Proceedings of the International Conference on Ion Implantation Technology, Kyoto IEEE, 1999. 1187-1190.
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