Simulation of plasma-immersed implantation of trenches

Rüde U (1999)


Publication Type: Conference contribution

Publication year: 1999

Publisher: IEEE

Edited Volumes: Proceedings of the International Conference on Ion Implantation Technology

Pages Range: 1187-1190

Conference Proceedings Title: IEEE Proceed. of the Intern. Conf. on Ion Implantation Technology

Event location: Kyoto

URI: http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=813896

Abstract

The results of a particle-in-cell simulation for the plasma system in the Plasma Immersion Ion Implantation context is presented. PIII of two-dimensional trenches is studied using this simulation. Modeling of the potential around the trenches and the development of the plasma sheath in dependence on the pulse time is demonstrated. The implanted concentration, the average impact ion angle and the ion energy are computed as function of the pulse time and discussed in dependence on the aspect ratios of trenches.

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How to cite

APA:

Rüde, U. (1999). Simulation of plasma-immersed implantation of trenches. In IEEE Proceed. of the Intern. Conf. on Ion Implantation Technology (pp. 1187-1190). Kyoto: IEEE.

MLA:

Rüde, Ulrich. "Simulation of plasma-immersed implantation of trenches." Proceedings of the International Conference on Ion Implantation Technology, Kyoto IEEE, 1999. 1187-1190.

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