Physical mechanisms during fs laser ablation of thin SiO2 films
Schmidt M, Rapp S, Domke M, Huber HP (2013)
Publication Type: Journal article
Publication year: 2013
Journal
Book Volume: 41
Pages Range: 734-740
DOI: 10.1016/j.phpro.2013.03.141
Authors with CRIS profile
Michael Schmidt
Lehrstuhl für Photonische Technologien
Stephan Rapp
Lehrstuhl für Photonische Technologien
Matthias Domke
Lehrstuhl für Photonische Technologien
Involved external institutions
Germany (DE)How to cite
APA:
Schmidt, M., Rapp, S., Domke, M., & Huber, H.P. (2013). Physical mechanisms during fs laser ablation of thin SiO2 films. Physics Procedia, 41, 734-740. https://dx.doi.org/10.1016/j.phpro.2013.03.141
MLA:
Schmidt, Michael, et al. "Physical mechanisms during fs laser ablation of thin SiO2 films." Physics Procedia 41 (2013): 734-740.
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