Atomic layer deposited aluminum oxide films on graphite and graphene studied by XPS and AFM

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Details zur Publikation

Autor(en): Speck F, Ostler M, Röhrl J, Emtsev K, Hundhausen M, Ley L, Seyller T
Zeitschrift: Physica Status Solidi (C) Current Topics in Solid State Physics
Verlag: Wiley - V C H Verlag GmbbH & Co.
Jahr der Veröffentlichung: 2010
Band: 7
Seitenbereich: 398
ISSN: 1862-6351
eISSN: 1610-1642


Abstract


Epitaxial graphene (EG) grown by solid-state decomposition of SiC is a promising material for future graphenebased electronics. On EG, the fabrication of a field-effect device requires the deposition of suitable gate insulator. Atomic layer deposition (ALD) of aluminum oxide might be useful for this purpose. Therefore, we investigated the growth of ALD-Al 2O 3 on highly oriented pyrolytic graphite (HOPG) and EG by atomic force microscopy (AFM), photoelectron spectroscopy (XPS) and Raman spectroscopy. Water as oxidant in the ALD process leads to inhomogeneous nucleation, whereas ozone leads to the formation of closed oxide layers. However, significant degradation of the EG takes place at higher temperatures and ozone exposure as witnessed by XPS and Raman spectroscopy. Careful adjustment of the process parameters allows reducing the damage to a level undetectable in XPS while providing enough nucleation centers for the formation of a closed Al 2O 3 film potentially suitable as a gate insulator. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.



FAU-Autoren / FAU-Herausgeber

Hundhausen, Martin apl. Prof. Dr.
Lehrstuhl für Laserphysik
Ley, Lothar Prof. Dr.
Naturwissenschaftliche Fakultät
Ostler, Markus
Lehrstuhl für Laserphysik
Seyller, Thomas PD Dr.
Lehrstuhl für Laserphysik
Speck, Florian
Naturwissenschaftliche Fakultät


Zitierweisen

APA:
Speck, F., Ostler, M., Röhrl, J., Emtsev, K., Hundhausen, M., Ley, L., & Seyller, T. (2010). Atomic layer deposited aluminum oxide films on graphite and graphene studied by XPS and AFM. Physica Status Solidi (C) Current Topics in Solid State Physics, 7, 398. https://dx.doi.org/10.1002/pssc.200982496

MLA:
Speck, Florian, et al. "Atomic layer deposited aluminum oxide films on graphite and graphene studied by XPS and AFM." Physica Status Solidi (C) Current Topics in Solid State Physics 7 (2010): 398.

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