In situ scanning tunneling microscopy study of selective dissolution of Au3Cu and Cu3Au (0 0 1)

Beitrag in einer Fachzeitschrift
(Originalarbeit)


Details zur Publikation

Autor(en): Renner FU, Eckstein G, Lymperakis L, Dakkouri AS, Rohwerder M, Jörg Neugebauer J, Stratmann M
Zeitschrift: Electrochimica Acta
Verlag: Elsevier
Jahr der Veröffentlichung: 2011
Band: 56
Heftnummer: 4
Seitenbereich: 1694-1700
ISSN: 0013-4686


Abstract


We present an electrochemical study of AuCu (0 0 1) single crystal surfaces in 0.1 mol dm HSO and 0.1 mol dm HSO + 0.1 mmol dm HCl, and of CuAu (0 0 1) in 0.1 mol dm HSO . The focus is on in situ scanning tunneling microscopy experiments. The changes of the surface morphology, which are time- and potential-dependent, have been observed, clearly resolving single atomic steps and mono-atomic islands and pits. Chloride additives enhance the surface diffusion and respective morphologies are observed earlier. All surfaces have shown considerable roughening already in the passive region far below the critical potential. © 2010 Elsevier Ltd All rights reserved.


FAU-Autoren / FAU-Herausgeber

Dakkouri-Baldauf, Andrea Dr.
Lehrstuhl für Werkstoffwissenschaften (Glas und Keramik)


Autor(en) der externen Einrichtung(en)
Max-Planck-Institut für Eisenforschung GmbH (MPIE) / Max Planck Institute for Iron Research


Zitierweisen

APA:
Renner, F.U., Eckstein, G., Lymperakis, L., Dakkouri, A.S., Rohwerder, M., Jörg Neugebauer, J., & Stratmann, M. (2011). In situ scanning tunneling microscopy study of selective dissolution of Au3Cu and Cu3Au (0 0 1). Electrochimica Acta, 56(4), 1694-1700. https://dx.doi.org/10.1016/j.electacta.2010.09.061

MLA:
Renner, Frank Uwe, et al. "In situ scanning tunneling microscopy study of selective dissolution of Au3Cu and Cu3Au (0 0 1)." Electrochimica Acta 56.4 (2011): 1694-1700.

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Zuletzt aktualisiert 2019-04-04 um 09:18