Koval Y (2004)
Publication Language: English
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 2004
Book Volume: 22
Pages Range: 843-851
Journal Issue: 2
DOI: 10.1116/1.1689306
The structure of the subsurface layer of polymethylmethacrylate (PMMA) formed by bombardment with low-energy ions of Ar was studied. The reduction in the energy of ions results in the modification of only a thin subsurface layer of a polymer. It was observed that the subsurface region contains a graphitized, cross-linked, and low-molecular weight layers. It was found that the ion etching causes various defects and typical features to appear on the surface of PMMA.
APA:
Koval, Y. (2004). Mechanism of etching and surface relief development of PMMA under low-energy ion bombardment. Journal of Vacuum Science & Technology B, 22(2), 843-851. https://doi.org/10.1116/1.1689306
MLA:
Koval, Yury. "Mechanism of etching and surface relief development of PMMA under low-energy ion bombardment." Journal of Vacuum Science & Technology B 22.2 (2004): 843-851.
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