Focused electron beam based direct-write fabrication of graphene and amorphous carbon from oxo-functionalized graphene on silicon dioxide

Beitrag in einer Fachzeitschrift


Details zur Publikation

Autor(en): Schindler S, Vollnhals F, Halbig C, Marbach H, Steinrück HP, Papp C, Eigler S
Zeitschrift: Physical Chemistry Chemical Physics
Verlag: ROYAL SOC CHEMISTRY
Jahr der Veröffentlichung: 2017
Band: 19
Heftnummer: 4
Seitenbereich: 2683-2686
ISSN: 1463-9076
eISSN: 1463-9084
Sprache: Englisch


Abstract


Controlled patterning of graphene is an important task towards device fabrication and thus is the focus of current research activities. Graphene oxide (GO) is a solution-processible precursor of graphene. It can be patterned by thermal processing. However, thermal processing of GO leads to decomposition and CO2 formation. Alternatively, focused electron beam induced processing (FEBIP) techniques can be used to pattern graphene with high spatial resolution. Based on this approach, we explore FEBIP of GO deposited on SiO2. Using oxo-functionalized graphene (oxo-G) with an in-plane lattice defect density of 1% we are able to image the electron beam-induced effects by scanning Raman microscopy for the first time. Depending on electron energy (2-30 keV) and doses (50-800 mC m(-2)) either reduction of GO or formation of permanent lattice defects occurs. This result reflects a step towards controlled FEBIP processing of oxo-G.



FAU-Autoren / FAU-Herausgeber

Halbig, Christian
Lehrstuhl für Organische Chemie II
Marbach, Hubertus PD Dr.
Lehrstuhl für Physikalische Chemie II
Papp, Christian PD Dr.
Lehrstuhl für Physikalische Chemie II
Steinrück, Hans-Peter Prof. Dr.
Lehrstuhl für Physikalische Chemie II
Vollnhals, Florian Dr.
Lehrstuhl für Physikalische Chemie II


Zusätzliche Organisationseinheit(en)
Exzellenz-Cluster Engineering of Advanced Materials


Autor(en) der externen Einrichtung(en)
Chalmers University of Technology / Chalmers tekniska högskola
Freie Universität Berlin


Zitierweisen

APA:
Schindler, S., Vollnhals, F., Halbig, C., Marbach, H., Steinrück, H.-P., Papp, C., & Eigler, S. (2017). Focused electron beam based direct-write fabrication of graphene and amorphous carbon from oxo-functionalized graphene on silicon dioxide. Physical Chemistry Chemical Physics, 19(4), 2683-2686. https://dx.doi.org/10.1039/c6cp08070g

MLA:
Schindler, Severin, et al. "Focused electron beam based direct-write fabrication of graphene and amorphous carbon from oxo-functionalized graphene on silicon dioxide." Physical Chemistry Chemical Physics 19.4 (2017): 2683-2686.

BibTeX: 

Zuletzt aktualisiert 2018-10-08 um 15:39