Physical vapor deposition of [EMIM][Tf2N]: A new approach to the modification of surface properties with ultrathin ionic liquid films

Cremer T, Killian M, Gottfried M, Paape N, Wasserscheid P, Maier F, Steinrück HP (2008)

Publication Type: Journal article

Publication year: 2008

Journal

Original Authors: Cremer T., Killian M., Gottfried J.M., Paape N., Wasserscheid P., Maier F., Steinrück H.-P.

Publisher: Wiley-Blackwell / Wiley-VCH Verlag

Book Volume: 9

Pages Range: 2185-2190

Journal Issue: 15

DOI: 10.1002/cphc.200800300

Abstract

Ultrathin films of the ionic liquid (IL) 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide, [EMIM][TfN], are prepared on a glass substrate by means of an in situ thermal-evaporation/condensation process under ultrahigh-vacuum conditions. By using X-ray photoelectron spectroscopy (XPS), it is demonstrated that the first layer of the IL film grows two dimensionally, followed by the three-dimensional growth of successive layers. The first molecular layer consists of a bilayer, with the [EMIM] cations in contact to the surface and the [TfN] anions at the vacuum side. The ultrathin IL films are found to be stable under ambient conditions. © 2008 Wiley-VCH Verlag GmbH & Co. KGaA.

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APA:

Cremer, T., Killian, M., Gottfried, M., Paape, N., Wasserscheid, P., Maier, F., & Steinrück, H.-P. (2008). Physical vapor deposition of [EMIM][Tf2N]: A new approach to the modification of surface properties with ultrathin ionic liquid films. ChemPhysChem, 9(15), 2185-2190. https://dx.doi.org/10.1002/cphc.200800300

MLA:

Cremer, Till, et al. "Physical vapor deposition of [EMIM][Tf2N]: A new approach to the modification of surface properties with ultrathin ionic liquid films." ChemPhysChem 9.15 (2008): 2185-2190.

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