Lenz T, Schmaltz T, Novak M, Halik M (2012)
Publication Language: English
Publication Type: Journal article, Report
Publication year: 2012
Book Volume: 28
Pages Range: 13900-13904
Journal Issue: 39
URI: http://pubs.acs.org/doi/abs/10.1021/la3027978
DOI: 10.1021/la3027978
In this work, we compared the kinetics of monolayer self-assembly long-chained carboxylic acids and phosphonic acids on thin aluminum oxide surfaces and investigated their dielectric properties in capacitors and low-voltage organic thin-film transistors. Phosphonic acid anchor groups tend to substitute carboxylic acid molecules on aluminum oxide surfaces and thus allow the formation of mixed or fully exchanged monolayers. With different alkyl chain substituents (n-alkyl or fluorinated alkyl chains), the exchange reaction can be monitored as a function of time by static contact angle measurements. The threshold voltage in α,α′-dihexyl-sexithiophene thin-film transistors composed of such mixed layer dielectrics correlates with the exchange progress and can be tuned from negative to positive values or vice versa depending on the dipole moment of the alkyl chain substituents. The change in the dipole moment with increasing exchange time also shifts the capacitance of these devices. The rate constants for exchange reactions determined by the time-dependent shift of static contact angle, threshold voltage, and capacitance exhibit virtually the same value thus proving the exchange kinetics to be highly controllable. In general, the exchange approach is a powerful tool in interface engineering, displaying a great potential for tailoring of device characteristics.
APA:
Lenz, T., Schmaltz, T., Novak, M., & Halik, M. (2012). Self-Assembled Monolayer Exchange Reactions as a Tool for Channel Interface Engineering in Low-Voltage Organic Thin-Film Transistors. Langmuir, 28(39), 13900-13904. https://doi.org/10.1021/la3027978
MLA:
Lenz, Thomas, et al. "Self-Assembled Monolayer Exchange Reactions as a Tool for Channel Interface Engineering in Low-Voltage Organic Thin-Film Transistors." Langmuir 28.39 (2012): 13900-13904.
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