Methylated [(arene)(1,3-cyclohexadiene)Ru(0)] complexes as low-melting MOCVD precursor complexes with a controlled follow-up chemistry of the ligands

Jipa I, Danova K, Popovska N, Siddiqi MA, Siddiqui RA, Atakan B, Cremer T, Maier F, Marbach H, Steinrück HP, Heinemann FW, Zenneck U (2011)


Publication Type: Journal article, Original article

Publication year: 2011

Journal

Original Authors: Jipa I., Danova K., Popovska N., Siddiqi M.A., Siddiqui R.A., Atakan B., Cremer T., Maier F., Marbach H., Steinrück H.-P., Heinemann F.W., Zenneck U.

Publisher: Royal Society of Chemistry

Book Volume: 21

Pages Range: 3014-3024

Journal Issue: 9

DOI: 10.1039/c0jm02652b

Abstract

[(Benzene)(2-methyl-1,3-cyclohexadiene)Ru(0)] (1), [(1,3-cyclohexadiene) (toluene)Ru(0)] (2), and [(methyl-cyclohexadiene)(toluene)Ru(0)] (3, mixture of isomers) have been prepared and tested as new metal organic ruthenium precursor complexes for chemical vapor deposition (MOCVD) with favorable properties. 1 is a low-melting precursor complex (mp = 29 °C) and the isomeric mixture 3 forms a liquid at room temperature. X-ray diffraction studies of single crystals of complexes 1 and 2 are characteristic for true Ru(0) π-complexes without molecular structure peculiarities or significant intermolecular interactions in the solid state, which could hinder undecomposed evaporation. Differential thermal analysis (DTA), differential scanning calorimetry (DSC) and vapor pressure data qualify the compounds as almost ideal MOCVD precursors. Thin ruthenium films have been deposited successfully on silicon wafers and substrate temperatures between 200 and 450 °C in inert gas atmospheres. Film growth and properties were evaluated by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and four-point probe conductivity measurements. All films consist of polycrystalline metallic ruthenium with a low surface roughness. © The Royal Society of Chemistry 2011.

Authors with CRIS profile

Involved external institutions

How to cite

APA:

Jipa, I., Danova, K., Popovska, N., Siddiqi, M.A., Siddiqui, R.A., Atakan, B.,... Zenneck, U. (2011). Methylated [(arene)(1,3-cyclohexadiene)Ru(0)] complexes as low-melting MOCVD precursor complexes with a controlled follow-up chemistry of the ligands. Journal of Materials Chemistry, 21(9), 3014-3024. https://dx.doi.org/10.1039/c0jm02652b

MLA:

Jipa, Ilona, et al. "Methylated [(arene)(1,3-cyclohexadiene)Ru(0)] complexes as low-melting MOCVD precursor complexes with a controlled follow-up chemistry of the ligands." Journal of Materials Chemistry 21.9 (2011): 3014-3024.

BibTeX: Download