Chemical stability of carbon-based inorganic materials for in situ x-ray investigations of ammonothermal crystal growth of nitrides

Beitrag in einer Fachzeitschrift
(Originalarbeit)


Details zur Publikation

Autorinnen und Autoren: Schimmel S, Künecke U, Meisel M, Hertweck B, Steigerwald T, Nebel C, Alt N, Schlücker E, Wellmann P
Zeitschrift: Journal of Crystal Growth
Verlag: Elsevier
Jahr der Veröffentlichung: 2016
Band: 456
Seitenbereich: 33-42
ISSN: 0022-0248
Sprache: Englisch


Abstract


The chemical stability of diamond, silicon carbide, vitreous carbon, and boron carbide in supercritical ammonia containing different mineralizers was investigated. The materials were found to show good corrosion resistance in the presence of selective or all tested mineralizers.Diamond was found to be virtually inert in both ammonoacidic and ammonobasic reaction media.Silicon carbide showed good chemical stability in varying ammonothermal reaction media.The chemical stability of vitreous carbon was found to depend on its manufacturing temperature.Corrosion of boron carbide strongly depends on the mineralizer used as well as on applied mechanical stress.Based on their chemical stability and mechanical properties, the applicability of the materials in the respective ammonothermal reaction media as construction materials is evaluated. Additionally, the applicability of the materials as a window material for both high energy . in situ x-ray imaging and low energy . in situ x-ray diffraction is discussed.



FAU-Autorinnen und Autoren / FAU-Herausgeberinnen und Herausgeber

Alt, Nicolas
Lehrstuhl für Prozessmaschinen und Anlagentechnik
Hertweck, Benjamin
Lehrstuhl für Prozessmaschinen und Anlagentechnik
Künecke, Ulrike Dr.-Ing.
Professur für Werkstoffwissenschaften (Werkstoffe der Elektrotechnik)
Schimmel, Saskia
Professur für Werkstoffwissenschaften (Werkstoffe der Elektrotechnik)
Schlücker, Eberhard Prof. Dr.-Ing.
Lehrstuhl für Prozessmaschinen und Anlagentechnik
Steigerwald, Thomas
Lehrstuhl für Prozessmaschinen und Anlagentechnik
Wellmann, Peter Prof. Dr.-Ing.
Professur für Werkstoffwissenschaften (Werkstoffe der Elektrotechnik)


Einrichtungen weiterer Autorinnen und Autoren

Fraunhofer-Institut für Angewandte Festkörperphysik (IAF) / Fraunhofer Institute for Applied Solid State Physics


Zitierweisen

APA:
Schimmel, S., Künecke, U., Meisel, M., Hertweck, B., Steigerwald, T., Nebel, C.,... Wellmann, P. (2016). Chemical stability of carbon-based inorganic materials for in situ x-ray investigations of ammonothermal crystal growth of nitrides. Journal of Crystal Growth, 456, 33-42. https://dx.doi.org/10.1016/j.jcrysgro.2016.08.067

MLA:
Schimmel, Saskia, et al. "Chemical stability of carbon-based inorganic materials for in situ x-ray investigations of ammonothermal crystal growth of nitrides." Journal of Crystal Growth 456 (2016): 33-42.

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Zuletzt aktualisiert 2018-20-11 um 13:50