Structure of n-Alkyltrichlorosilane Mono layers on Si(100)/SiO2

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Details zur Publikation

Autorinnen und Autoren: Steinrück HG, Will J, Magerl A, Ocko B
Zeitschrift: Langmuir
Verlag: AMER CHEMICAL SOC
Jahr der Veröffentlichung: 2015
Band: 31
Heftnummer: 43
Seitenbereich: 11774-11780
ISSN: 0743-7463
eISSN: 1520-5827


Abstract


The structure of n-alkyltrichlorosilane self-assembled monolayers (SAMs) of alkyl chain lengths n = 12, 14, 18, and 22 formed on the amorphous native oxide of silicon (100) has been investigated via angstrom-resolution surface X-ray scattering techniques, with particular focus on the proliferation of lateral order along the molecules' long axis. Grazing incidence diffraction shows that the monolayer is composed of hexagonally packed crystalline-like domains for n = 14, 18, and 22 with a lateral size of about 60 A. However, Bragg rod analysis shows that similar to 12 of the CH, units are not included in the crystalline-like domains. We assign this, and the limited lateral crystallites' size, to strain induced by the size mismatch between the optimal chain-chain and headgroup-headgroup spacings. Analysis of X-ray reflectivity profiles for n = 12, 14, and 22 shows that the density profile used to successfully model n = 18 provides an excellent fit where the analysis-derived parameters provide complementary structural information to the grazing incidence results.



FAU-Autorinnen und Autoren / FAU-Herausgeberinnen und Herausgeber

Magerl, Andreas Prof. Dr.
Naturwissenschaftliche Fakultät
Steinrück, Hans-Georg
Lehrstuhl für Kristallographie und Strukturphysik
Will, Johannes Dr.
Lehrstuhl für Kristallographie und Strukturphysik


Einrichtungen weiterer Autorinnen und Autoren

Brookhaven National Laboratory


Zitierweisen

APA:
Steinrück, H.-G., Will, J., Magerl, A., & Ocko, B. (2015). Structure of n-Alkyltrichlorosilane Mono layers on Si(100)/SiO2. Langmuir, 31(43), 11774-11780. https://dx.doi.org/10.1021/acs.langmuir.5b03091

MLA:
Steinrück, Hans-Georg, et al. "Structure of n-Alkyltrichlorosilane Mono layers on Si(100)/SiO2." Langmuir 31.43 (2015): 11774-11780.

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