Pinzek S, Beckenbach T, Viermetz M, Meyer P, Gustschin A, Andrejewski J, Gustschin N, Herzen J, Schulz J, Pfeiffer F (2021)
Publication Type: Journal article
Publication year: 2021
Book Volume: 20
Article Number: 043801
Journal Issue: 4
DOI: 10.1117/1.JMM.20.4.043801
Background: X-ray grating interferometry is an emerging imaging technique that strongly relies on fine grating structures. A common method to fabricate compatible gratings is deep X-ray lithography (DXRL). Aim: To develop a method to fabricate grating structures by DXRL, which does not require a synchrotron source. Approach: The synchrotron source is replaced by a conventional X-ray tube. The fabrication process is adapted for the divergent beam by cylindrically bending mask and substrate. Results: A 10-μm period absorption grating with 80-μm-thick gold lamellae is successfully fabricated from an intermediate 110-μm high structured resist. This grating is characterized and implemented in a preclinical Talbot-Lau interferometer designed for medical thorax imaging. Conclusion: This approach can overcome the strong dependence on synchrotron facilities for the fabrication of gratings for X-ray grating interferometry. As X-ray tubes are more widely available, this is a cost-efficient and scalable alternative suitable for industrial production.
APA:
Pinzek, S., Beckenbach, T., Viermetz, M., Meyer, P., Gustschin, A., Andrejewski, J.,... Pfeiffer, F. (2021). Fabrication of X-ray absorption gratings via deep X-ray lithography using a conventional X-ray tube. Journal of Micro-Nanolithography MEMS and MOEMS, 20(4). https://doi.org/10.1117/1.JMM.20.4.043801
MLA:
Pinzek, Simon, et al. "Fabrication of X-ray absorption gratings via deep X-ray lithography using a conventional X-ray tube." Journal of Micro-Nanolithography MEMS and MOEMS 20.4 (2021).
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