Immediate development of processing windows for selective electron beam melting using layerwise monitoring via backscattered electron detection

Journal article


Publication Details

Author(s): Pobel C, Arnold C, Osmanlic F, Fu Z, Körner C
Journal: Materials Letters
Publication year: 2019
ISSN: 0167-577X
Language: English


Abstract

The availability of a reliable processing window is the basic
requirement for processing new materials via selective electron beam
melting (SEBM). Typically, these processing windows are derived by a
time-consuming procedure comprising fabrication, metallographic
preparation and analysis of standardized specimens for every parameter
set. This study demonstrates the immediate development of a processing
window during one single SEBM process. An electron optical image
acquisition system provides the necessary information for evaluation and
subsequent adaption of process parameters. It is shown that this
immediate approach delivers processing windows with sufficient accuracy,
while the required time is substantially reduced from weeks or even
months to several hours.



FAU Authors / FAU Editors

Arnold, Christopher
Lehrstuhl für Werkstoffwissenschaften (Werkstoffkunde und Technologie der Metalle)
Fu, Zongwen
Zentralinstitut für Neue Materialien und Prozesstechnik
Körner, Carolin Prof. Dr.-Ing.
Lehrstuhl für Werkstoffwissenschaften (Werkstoffkunde und Technologie der Metalle)
Osmanlic, Fuad
Lehrstuhl für Werkstoffwissenschaften (Werkstoffkunde und Technologie der Metalle)
Pobel, Christoph
Lehrstuhl für Werkstoffwissenschaften (Werkstoffkunde und Technologie der Metalle)


Research Fields

Additive Manufacturing
Lehrstuhl für Werkstoffwissenschaften (Werkstoffkunde und Technologie der Metalle)


How to cite

APA:
Pobel, C., Arnold, C., Osmanlic, F., Fu, Z., & Körner, C. (2019). Immediate development of processing windows for selective electron beam melting using layerwise monitoring via backscattered electron detection. Materials Letters. https://dx.doi.org/10.1016/j.matlet.2019.03.048

MLA:
Pobel, Christoph, et al. "Immediate development of processing windows for selective electron beam melting using layerwise monitoring via backscattered electron detection." Materials Letters (2019).

BibTeX: 

Last updated on 2019-27-03 at 10:53