The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition

Beitrag in einer Fachzeitschrift


Details zur Publikation

Autor(en): Hoeflich K, Yang RB, Berger A, Leuchs G, Christiansen S
Zeitschrift: Advanced Materials
Jahr der Veröffentlichung: 2011
Band: 23
Heftnummer: 22-23
Seitenbereich: 2657-2661
ISSN: 0935-9648
eISSN: 1521-4095


Abstract

Various nanostructures are directly written by electron-beam-induced deposition using dimethyl-gold(III)-acetylacetonate as the precursor gas. After purification, their potential applications include plasmonic devices and metamaterials. Carbon contamination of the as-written structures can be completely removed by low-temperature ozone treatment, leaving polycrystalline pure gold structures (see figure). This treatment reduces the size of the nanostructures but does not substantially alter their functional shape.


FAU-Autoren / FAU-Herausgeber

Leuchs, Gerd Prof. Dr.
Lehrstuhl für Experimentalphysik (Optik)


Zusätzliche Organisationseinheit(en)
Exzellenz-Cluster Engineering of Advanced Materials


Autor(en) der externen Einrichtung(en)
Leibniz-Institut für Photonische Technologien e.V.
Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics


Zitierweisen

APA:
Hoeflich, K., Yang, R.B., Berger, A., Leuchs, G., & Christiansen, S. (2011). The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition. Advanced Materials, 23(22-23), 2657-2661. https://dx.doi.org/10.1002/adma.201004114

MLA:
Hoeflich, Katja, et al. "The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition." Advanced Materials 23.22-23 (2011): 2657-2661.

BibTeX: 

Zuletzt aktualisiert 2019-14-03 um 09:08