Atomic layer deposition of phosphorus oxide films as solid sources for doping of semiconductor structures

Conference contribution


Publication Details

Author(s): Kalkofen B, Ahmed B, Beljakowa S, Lisker M, Kim YS, Burte EP
Publisher: IEEE
Publishing place: NEW YORK
Publication year: 2018
Conference Proceedings Title: 2018 IEEE 18TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO)
ISSN: 1944-9399


FAU Authors / FAU Editors

Beljakowa, Svetlana Dr.
Lehrstuhl für Elektronische Bauelemente


External institutions with authors

Lam Research
Otto-von-Guericke-Universität Magdeburg


How to cite

APA:
Kalkofen, B., Ahmed, B., Beljakowa, S., Lisker, M., Kim, Y.S., & Burte, E.P. (2018). Atomic layer deposition of phosphorus oxide films as solid sources for doping of semiconductor structures. In 2018 IEEE 18TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO). Cork, IE: NEW YORK: IEEE.

MLA:
Kalkofen, Bodo, et al. "Atomic layer deposition of phosphorus oxide films as solid sources for doping of semiconductor structures." Proceedings of the 18th IEEE International Conference on Nanotechnology (IEEE-NANO), Cork NEW YORK: IEEE, 2018.

BibTeX: 

Last updated on 2019-11-03 at 12:53