Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching

Rommel M, Rumler M, Haas A, Bauer AJ, Frey L (2013)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2013

Journal

Microelectronic Engineering Elsevier

Publisher: Elsevier B.V.

Book Volume: 110

Pages Range: 177-182

DOI: 10.1016/j.mee.2013.03.081

Authors with CRIS profile

Maximilian Rumler Lehrstuhl für Elektronische Bauelemente Lothar Frey Lehrstuhl für Elektronische Bauelemente

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE)

How to cite

APA:

Rommel, M., Rumler, M., Haas, A., Bauer, A.J., & Frey, L. (2013). Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching. Microelectronic Engineering, 110, 177-182. https://dx.doi.org/10.1016/j.mee.2013.03.081

MLA:

Rommel, Mathias, et al. "Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching." Microelectronic Engineering 110 (2013): 177-182.

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