Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition

Journal article
(Original article)


Publication Details

Author(s): Lipp S, Frey L, Lehrer C, Frank B, Demm E, Pauthner S, Ryssel H
Journal: Journal of Vacuum Science & Technology B
Publication year: 1996
Volume: 14
Journal issue: 6
Pages range: 3920-3923
ISSN: 1071-1023


FAU Authors / FAU Editors

Frey, Lothar Prof. Dr.
Lehrstuhl für Elektronische Bauelemente
Ryssel, Heiner Prof. Dr.
Technische Fakultät


External institutions with authors

Fraunhofer-Institut für Integrierte Schaltungen (IIS)


How to cite

APA:
Lipp, S., Frey, L., Lehrer, C., Frank, B., Demm, E., Pauthner, S., & Ryssel, H. (1996). Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition. Journal of Vacuum Science & Technology B, 14(6), 3920-3923.

MLA:
Lipp, S., et al. "Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition." Journal of Vacuum Science & Technology B 14.6 (1996): 3920-3923.

BibTeX: 

Last updated on 2019-07-03 at 09:53