Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition

Lipp S, Frey L, Lehrer C, Frank B, Demm E, Pauthner S, Ryssel H (1996)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 1996

Journal

Journal of Vacuum Science & Technology B American Institute of Physics (AIP)

Book Volume: 14

Pages Range: 3920-3923

Journal Issue: 6

URI: https://www.scopus.com/record/display.uri?eid=2-s2.0-0000353753∨igin=inward

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente Heiner Ryssel Technische Fakultät

Involved external institutions

Fraunhofer-Institut für Integrierte Schaltungen (IIS) DE Germany (DE)

How to cite

APA:

Lipp, S., Frey, L., Lehrer, C., Frank, B., Demm, E., Pauthner, S., & Ryssel, H. (1996). Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition. Journal of Vacuum Science & Technology B, 14(6), 3920-3923.

MLA:

Lipp, S., et al. "Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition." Journal of Vacuum Science & Technology B 14.6 (1996): 3920-3923.

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