A comparison of focused ion beam and electron beam induced deposition processes

Lipp S, Frey L, Lehrer C, Demm E, Pauthner S, Ryssel H (1996)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 1996

Journal

Microelectronics Reliability Elsevier

Book Volume: 36

Pages Range: 1779-1782

URI: https://www.scopus.com/record/display.uri?eid=2-s2.0-0030274008∨igin=inward

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente Heiner Ryssel Technische Fakultät

How to cite

APA:

Lipp, S., Frey, L., Lehrer, C., Demm, E., Pauthner, S., & Ryssel, H. (1996). A comparison of focused ion beam and electron beam induced deposition processes. Microelectronics Reliability, 36, 1779-1782.

MLA:

Lipp, S., et al. "A comparison of focused ion beam and electron beam induced deposition processes." Microelectronics Reliability 36 (1996): 1779-1782.

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