Bachmann J, Zierold R, Chong YT, Hauert R, Sturm C, Schmidt-Grund R, Rheinlaender B, Grundmann M, Goesele U, Nielsch K (2008)
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 2008
Publisher: Wiley-VCH Verlag
Book Volume: 47
Pages Range: 6177-6179
APA:
Bachmann, J., Zierold, R., Chong, Y.T., Hauert, R., Sturm, C., Schmidt-Grund, R.,... Nielsch, K. (2008). A practical, self-catalytic, atomic layer deposition of silicon dioxide. Angewandte Chemie International Edition, 47, 6177-6179. https://doi.org/10.1002/anie.200800245
MLA:
Bachmann, Julien, et al. "A practical, self-catalytic, atomic layer deposition of silicon dioxide." Angewandte Chemie International Edition 47 (2008): 6177-6179.
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