A practical, self-catalytic, atomic layer deposition of silicon dioxide

Journal article
(Original article)


Publication Details

Author(s): Bachmann J, Zierold R, Chong YT, Hauert R, Sturm C, Schmidt-Grund R, Rheinlaender B, Grundmann M, Goesele U, Nielsch K
Journal: Angewandte Chemie-International Edition
Publisher: Wiley-VCH Verlag
Publication year: 2008
Volume: 47
Pages range: 6177-6179
ISSN: 1433-7851


FAU Authors / FAU Editors

Bachmann, Julien Prof.
Lehrstuhl für Chemistry of thin film materials


External institutions with authors

Eidgenössische Materialprüfungs- und Forschungsanstalt (Empa) / Swiss Federal Laboratories for Materials Science & Technology
Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics
Universität Hamburg
Universität Leipzig


How to cite

APA:
Bachmann, J., Zierold, R., Chong, Y.T., Hauert, R., Sturm, C., Schmidt-Grund, R.,... Nielsch, K. (2008). A practical, self-catalytic, atomic layer deposition of silicon dioxide. Angewandte Chemie-International Edition, 47, 6177-6179. https://dx.doi.org/10.1002/anie.200800245

MLA:
Bachmann, Julien, et al. "A practical, self-catalytic, atomic layer deposition of silicon dioxide." Angewandte Chemie-International Edition 47 (2008): 6177-6179.

BibTeX: 

Last updated on 2018-21-07 at 11:23