A practical, self-catalytic, atomic layer deposition of silicon dioxide

Bachmann J, Zierold R, Chong YT, Hauert R, Sturm C, Schmidt-Grund R, Rheinlaender B, Grundmann M, Goesele U, Nielsch K (2008)


Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2008

Journal

Publisher: Wiley-VCH Verlag

Book Volume: 47

Pages Range: 6177-6179

DOI: 10.1002/anie.200800245

Authors with CRIS profile

Involved external institutions

How to cite

APA:

Bachmann, J., Zierold, R., Chong, Y.T., Hauert, R., Sturm, C., Schmidt-Grund, R.,... Nielsch, K. (2008). A practical, self-catalytic, atomic layer deposition of silicon dioxide. Angewandte Chemie International Edition, 47, 6177-6179. https://dx.doi.org/10.1002/anie.200800245

MLA:

Bachmann, Julien, et al. "A practical, self-catalytic, atomic layer deposition of silicon dioxide." Angewandte Chemie International Edition 47 (2008): 6177-6179.

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