From evaporation-induced self-assembly to shear-induced alignment

Journal article
(Original article)


Publication Details

Author(s): Srikantharajah R, Schindler T, Landwehr I, Romeis S, Unruh T, Peukert W
Journal: Nanoscale
Publisher: Royal Society of Chemistry
Publication year: 2016
Volume: 8
Journal issue: 47
Pages range: 19882-19893
ISSN: 2040-3364
eISSN: 2040-3372


Abstract


The functionality of compact nanostructured thin films depends critically on the degree of order and hence on the underlying ordering mechanisms during film formation. For dip coating of rigid nanorods the counteracting mechanisms, evaporation-induced self-assembly (EISA) and shear-induced alignment (SIA) have recently been identified as competing ordering mechanisms. Here, we show how to achieve highly ordered and homogeneous thin films by controlling EISA and SIA in dip coating. Therefore we identify the influences of the process parameters including temperature, initial volume fraction and nanorod aspect ratio on evaporation-induced convective flow and externally applied shear forces and evaluate the resulting films. The impact of evaporation and shear can be distinguished by analysing film thickness, surface order and bulk order by careful in situ SAXS, Raman and SEM-based image analysis. For the first time we derive processing guidelines for the controlled application of EISA and SIA towards highly ordered thin nematic films.



FAU Authors / FAU Editors

Landwehr, Inga
Lehrstuhl für Feststoff- und Grenzflächenverfahrenstechnik
Peukert, Wolfgang Prof. Dr.-Ing.
Lehrstuhl für Feststoff- und Grenzflächenverfahrenstechnik
Romeis, Stefan Dr.-Ing.
Lehrstuhl für Feststoff- und Grenzflächenverfahrenstechnik
Schindler, Torben
Professur für Nanomaterialcharakterisierung (Streumethoden)
Srikantharajah, Rubitha
Lehrstuhl für Feststoff- und Grenzflächenverfahrenstechnik
Unruh, Tobias Prof. Dr.
Professur für Nanomaterialcharakterisierung (Streumethoden)


Additional Organisation
Graduiertenkolleg 1896/2 In situ Mikroskopie mit Elektronen, Röntgenstrahlen und Rastersonden
Exzellenz-Cluster Engineering of Advanced Materials
Interdisziplinäres Zentrum, Center for Nanoanalysis and Electron Microscopy (CENEM)


Research Fields

A1 Functional Particle Systems
Exzellenz-Cluster Engineering of Advanced Materials
A2 Nanoanalysis and Microscopy
Exzellenz-Cluster Engineering of Advanced Materials


How to cite

APA:
Srikantharajah, R., Schindler, T., Landwehr, I., Romeis, S., Unruh, T., & Peukert, W. (2016). From evaporation-induced self-assembly to shear-induced alignment. Nanoscale, 8(47), 19882-19893. https://dx.doi.org/10.1039/c6nr06586d

MLA:
Srikantharajah, Rubitha, et al. "From evaporation-induced self-assembly to shear-induced alignment." Nanoscale 8.47 (2016): 19882-19893.

BibTeX: 

Last updated on 2019-03-06 at 16:41