Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation

Journal article
(Original article)


Publication Details

Author(s): Strauß J, Baum M, Alexeev I, Schmidt M
Journal: Journal of Laser Micro Nanoengineering
Publication year: 2017
Volume: 12
Journal issue: 2
Pages range: 86-90
ISSN: 1880-0688
Language: English


Abstract


In this publication we present a novel setup for the Optical Trap Assisted Nanopatterning (OTAN) technology. The setup allows process parallelization and thus higher throughput in this inventive and flexible direct-nanopatterning technology. We have determined the stiffness of the optical traps and compared the obtained result with the single beam OTAN parameters. Furthermore we estimate the increase in throughput for the parallelized approach in comparison to the conventional system


FAU Authors / FAU Editors

Alexeev, Ilya
Lehrstuhl für Photonische Technologien
Baum, Marcus
Lehrstuhl für Photonische Technologien
Schmidt, Michael Prof. Dr.-Ing.
Lehrstuhl für Photonische Technologien
Strauß, Johannes
Lehrstuhl für Photonische Technologien


Additional Organisation
Lehrstuhl für Photonische Technologien
Erlangen Graduate School in Advanced Optical Technologies


Research Fields

Optische Technologien
Research focus area of a faculty: Technische Fakultät


How to cite

APA:
Strauß, J., Baum, M., Alexeev, I., & Schmidt, M. (2017). Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation. Journal of Laser Micro Nanoengineering, 12(2), 86-90. https://dx.doi.org/10.2961/jlmn.2017.02.0007

MLA:
Strauß, Johannes, et al. "Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation." Journal of Laser Micro Nanoengineering 12.2 (2017): 86-90.

BibTeX: 

Last updated on 2018-17-10 at 22:40