Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation

Strauß J, Baum M, Alexeev I, Schmidt M (2017)

Publication Language: English

Publication Type: Journal article, Original article

Publication year: 2017

Journal

Journal of Laser Micro Nanoengineering Japan Laser Processing Society (JLPS)

Book Volume: 12

Pages Range: 86-90

Journal Issue: 2

URI: http://www.jlps.gr.jp/jlmn/upload/267828b35a4a05b6fd4d0589b6b25a1c.pdf

DOI: 10.2961/jlmn.2017.02.0007

Open Access Link: http://www.jlps.gr.jp/jlmn/upload/267828b35a4a05b6fd4d0589b6b25a1c.pdf

Abstract

In this publication we present a novel setup for the Optical Trap Assisted Nanopatterning (OTAN) technology. The setup allows process parallelization and thus higher throughput in this inventive and flexible direct-nanopatterning technology. We have determined the stiffness of the optical traps and compared the obtained result with the single beam OTAN parameters. Furthermore we estimate the increase in throughput for the parallelized approach in comparison to the conventional system

Authors with CRIS profile

Johannes Strauß Lehrstuhl für Photonische Technologien Marcus Baum Lehrstuhl für Photonische Technologien Ilya Alexeev Lehrstuhl für Photonische Technologien Michael Schmidt Lehrstuhl für Photonische Technologien

Additional Organisation(s)

Lehrstuhl für Photonische Technologien Erlangen Graduate School in Advanced Optical Technologies

How to cite

APA:

Strauß, J., Baum, M., Alexeev, I., & Schmidt, M. (2017). Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation. Journal of Laser Micro Nanoengineering, 12(2), 86-90. https://dx.doi.org/10.2961/jlmn.2017.02.0007

MLA:

Strauß, Johannes, et al. "Optical Trap Assisted Nanopatterning: Process Parallelization and Dynamic Structure Generation." Journal of Laser Micro Nanoengineering 12.2 (2017): 86-90.

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