Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation

Conference contribution
(Original article)


Publication Details

Author(s): Strauß J, Baum M, Alexeev I, Schmidt M
Publication year: 2015
Language: English


Abstract


In this publication we present a novel setup for Optical Trap Assisted Nanopatterning (OTAN) technology. The setup allows for parallelization and thus for higher throughput in this inventive and flexible direct-nanopatterning technology. In addition we present first results of parallel nanoscale structuring. We determine the stiffness of optical traps and compare the result to previous results of single OTAN. Furthermore we estimate the increase of throughput for the parallelized approach with respect to the conventional system.



FAU Authors / FAU Editors

Alexeev, Ilya
Lehrstuhl für Photonische Technologien
Baum, Marcus
Lehrstuhl für Photonische Technologien
Schmidt, Michael Prof. Dr.-Ing.
Lehrstuhl für Photonische Technologien
Strauß, Johannes
Lehrstuhl für Photonische Technologien


How to cite

APA:
Strauß, J., Baum, M., Alexeev, I., & Schmidt, M. (2015). Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation. Japan, JP.

MLA:
Strauß, Johannes, et al. "Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation." Proceedings of the International Congress on Laser Advanced Materials Processing, Japan 2015.

BibTeX: 

Last updated on 2018-19-04 at 03:54