Contact resistivity and suppression of Fermi level pinning in side-contacted germanium nanowires

Kolesnik-Gray M, Lutz T, Collins G, Biswas S, Holmes JD, Krstic V (2013)


Publication Language: English

Publication Type: Journal article, Letter

Publication year: 2013

Journal

Publisher: American Institute of Physics (AIP)

Book Volume: 103

Article Number: 153101

URI: http://scitation.aip.org/content/aip/journal/apl/103/15/10.1063/1.4821996

DOI: 10.1063/1.4821996

Abstract

Electrical properties of contact-interfaces in germanium nanowire field effect transistor devices are studied. In contrast to planar bulk devices, it is shown that the active conduction channel and gate length extend between and underneath the contact electrodes. Furthermore, direct scaling of contact resistivity and Schottky barrier height with electrode metal function is observed. The associated pinning parameter was found to be gamma = 0.65 ± 0.03, which demonstrates a significant suppression of Fermi level pinning in quasi-one-dimensional structures.

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APA:

Kolesnik-Gray, M., Lutz, T., Collins, G., Biswas, S., Holmes, J.D., & Krstic, V. (2013). Contact resistivity and suppression of Fermi level pinning in side-contacted germanium nanowires. Applied Physics Letters, 103. https://dx.doi.org/10.1063/1.4821996

MLA:

Kolesnik-Gray, Maria, et al. "Contact resistivity and suppression of Fermi level pinning in side-contacted germanium nanowires." Applied Physics Letters 103 (2013).

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