Keeping argon under a graphene lid - Argon intercalation between graphene and nickel(111)

Steinrück HP, Bauer U, Gotterbarm K, Späth F, Papp C, Höfert O, Gleichweit C, Amende M (2016)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2016

Journal

Publisher: Elsevier

Book Volume: 643

Pages Range: 222-226

DOI: 10.1016/j.susc.2015.05.009

Abstract

We report on the intercalation of graphene grown on a Ni(111) crystal with argon. Argon is implanted in the Ni(111) crystal by ion bombardment before graphene growth, and diffuses to the surface during the growth of graphene at elevated temperatures. Graphene acts as an atomically thin barrier and keeps the argon underneath. We investigated this system with high resolution X-ray photoelectron spectroscopy. From our experiments we determined the mean quantities of argon under graphene. From our analysis, a simple model to determine the pressure under the graphene layer is presented. In our measurements, we find an increased thermal stability of the intercalated graphene as compared to non-intercalated graphene on Ni(111).

Authors with CRIS profile

Additional Organisation(s)

How to cite

APA:

Steinrück, H.-P., Bauer, U., Gotterbarm, K., Späth, F., Papp, C., Höfert, O.,... Amende, M. (2016). Keeping argon under a graphene lid - Argon intercalation between graphene and nickel(111). Surface Science, 643, 222-226. https://dx.doi.org/10.1016/j.susc.2015.05.009

MLA:

Steinrück, Hans-Peter, et al. "Keeping argon under a graphene lid - Argon intercalation between graphene and nickel(111)." Surface Science 643 (2016): 222-226.

BibTeX: Download