Bottom-gated epitaxial graphene

Beitrag in einer Fachzeitschrift

Details zur Publikation

Autor(en): Waldmann D, Jobst J, Speck F, Seyller T, Krieger M, Weber HB
Zeitschrift: Nature Materials
Verlag: Nature Publishing Group
Jahr der Veröffentlichung: 2011
Band: 10
Seitenbereich: 357-360
ISSN: 1476-1122


High-quality epitaxial graphene on silicon carbide (SiC) is today available in wafer size. Similar to exfoliated graphene, its charge carriers are governed by the Dirac-Weyl Hamiltonian and it shows excellent mobilities. For many experiments with graphene, in particular for surface science, a bottom gate is desirable. Commonly, exfoliated graphene flakes are placed on an oxidized silicon wafer that readily provides a bottom gate. However, this cannot be applied to epitaxial graphene as the SiC provides the source material out of which graphene grows. Here, we present a reliable scheme for the fabrication of bottom-gated epitaxial graphene devices, which is based on nitrogen (N) implantation into a SiC wafer and subsequent graphene growth. We demonstrate working devices in a broad temperature range from 6 to 300-K. Two gating regimes can be addressed, which opens a wide engineering space for tailored devices by controlling the doping of the gate structure. © 2011 Macmillan Publishers Limited. All rights reserved.

FAU-Autoren / FAU-Herausgeber

Jobst, Johannes
Waldmann, Daniel
Lehrstuhl für Angewandte Physik
Krieger, Michael Dr.
Lehrstuhl für Angewandte Physik
Seyller, Thomas PD Dr.
Naturwissenschaftliche Fakultät
Speck, Florian
Sonderforschungsbereich 953/2 Synthetische Kohlenstoffallotrope
Lehrstuhl für Angewandte Physik
Weber, Heiko B. Prof. Dr.
Lehrstuhl für Angewandte Physik

Zusätzliche Organisationseinheit(en)
Exzellenz-Cluster Engineering of Advanced Materials


Waldmann, D., Jobst, J., Speck, F., Seyller, T., Krieger, M., & Weber, H.B. (2011). Bottom-gated epitaxial graphene. Nature Materials, 10, 357-360.

Waldmann, Daniel, et al. "Bottom-gated epitaxial graphene." Nature Materials 10 (2011): 357-360.


Zuletzt aktualisiert 2018-08-08 um 04:09